Thin Film Deposition

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The MAGNION Series of sputter deposition systems are turn-key units customized to fit the end users' requirements. They are highly versatile with fully integrated control and data acquisition systems. Plasmionique’s proprietary MAGNION Series sputtering cathodes are designed for high target utilization efficiency, and are available in balanced and unbalanced magnetic configurations in circular or rectangular shapes. The magnetron cathodes are able to operate in DC, pulse-DC, AC or RF biasing modes. 

Optionally, these systems can include a PLUME series remote plasma source for Enhanced Reactive Sputter Deposition. Substrate rotation, heating, biasing, and computer controlled axial motions are options available on all systems. f customers can’t find it, it doesn’t exist. Clearly list and describe the services you offer. Also, be sure to showcase a premium service.

 All types of thin film deposition and PVD techniques including Sputtering and more from our Sydney base in Australia. 

The EVAD Series allows for the evaporation of metals, dielectrics and organic materials using E-beams, Evaporation boats and Effusion cells for application to thin film deposition and epitaxial growth of materials. Large or table-top units with full computer controlled features allow thickness control with high precision. Glovebox integration also available.

Selection of evaporation method mainly depends on vaporization temperature of depositing material:

• Evaporation boats, baskets, or filaments for metals, temperatures up to 1800 °C, power up to about 2 kW
   
• Low Temperature Effusion Cell for organics
   
  • choice of crucible materials and temperature range to suit material
     
  • precise temperature monitoring and PID control
     
  • shutter with manual or automatic control
     
• E-beam evaporators (single or multi pocket sources)
•  All types of thin film deposition and PVD techniques including Sputtering and more from our Sydney base in Australia.
   

GLAZE Series Pulsed Laser Deposition (PLD) systems are designed for advanced thin film coating applications. Advantages of PLD are its simplicity and ability to preserve the often complex stoichiometry of the target material in the deposited film.

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A PLD system uses the energy of a focused laser beam to vaporize a solid target material. Choice of laser pulse duration from the femtosecond to nanosecond range can be used to control film structure.

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A proprietary hybrid Magnetron-PLD (MPLD) method, developed by Plasmionique, combines low energy laser pulses with a magnetron discharge to reduce deposition pressure, increase deposition efficiency, and improve the density and smoothness of the deposited coating are your customers raving about you on social media? Share their great stories to help turn potential customers into loyal ones.

All types of thin film deposition and PVD techniques including Sputtering and more from our Sydney base in Australia. 

FLARION-RF series plasma reactors are offered in Capacitively Coupled Plasma (CCP) or Inductively Coupled Plasma (ICP) configuration. Etching or PECVD process processes are carried out using gases or precursors having chemically reactive radicals.

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Capacitively Coupled Plasmas in etching reactors are generated between two parallel electrodes. CCP reactors are the most common plasma systems used in dry etching. The power is applied to the lower (Reactive Ion Etching, RIE) or the upper electrode (Plasma Etching, PE) . Typical reactors use 13.56 MHz RF power. The lower electrode is the substrate holder and the top electrode forms the gas showerhead.

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Inductively Coupled Plasmas are generated by coupling the RF field of a coil-shaped antenna to the plasma through a dielectric. The most common reactors have a flat, pancake style antenna, with the antenna in atmosphere, with the dielectric being either quartz or alumina. 

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In ICP reactors, the substrate holder is often biased, allowing independent control of plasma density and the energy of ions bombarding the substrate. This feature is required for Deep Reactive Ion Etching (DRIE). 

All types of thin film deposition and PVD techniques including Sputtering and more from our Sydney base in Australia.

Horizontal CVD Furnaces

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These furnaces have the option to operate with single- or multi- heating zones. Combined with FLOCON series gas, vapor and liquid flow management systems, they offer unparalleled flexibility. Provisions to tilt the furnace for loading and unloading the powder can be integrated.

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Horizontal PECVD Furnaces

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Combining the PLUME series ICP plasma sources, with the furnace allows conversion of system to a PECVD Furnace, allowing for PECVD or PE-ALD synthesis on large areas.if have questions, you have answers. Display the most frequently asked questions, so everybody benefits.

 All types of thin film deposition and PVD techniques including Sputtering and more from our Sydney base in Australia. 

PUPION series, PUlsed Plasma ION implanters, can operate with a continuous working (CW) plasma and a pulsed substrate bias voltage or with constant bias and a pulsed plasma.  The pulsed plasma option is particularly useful when mono-energetic ion implantation is critical. 

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PUPION systems have a demonstrated ability to minimize contamination during implantation of radioisotopes. A variety of plasma excitation techniques are offered, depending on the required application. The systems are fully computer controlled and an integrated data acquisition system for real-time process parameter monitoring as well as data logging are also included. Typically, voltages up to 10 kV are used.

 All types of thin film deposition and PVD techniques including Sputtering and more from our Sydney base in Australia. 

The ATMOS Series  integrate various plasma technologies for in-line surface treatment of solids materials, such as wood, plastic, and rolled sheets of metallic, polymeric, textile and paper.

Technologies integrated in this series include:

• Plasma Sources :  Dielectric Barrier Discharge; ICP, CCP and Microwave plasma sources, such as Surfatron, Surfguid, ECR , etc.

• PVD :  Magnetron Sputtering cathodes, Thermal and ebeam Evaporators 

• Nanoparticle Deposition and Synthesis: PVD, CVD, PECVD, Spray

• Ion Beam Sources: 100eV to 3 KeV,  surface cleaning

• Furnace : CVD 

• Laser : PLD, Surface patterning, etc 

• Diagnostics:  Temperature, Spectroscopy, Thickness Monitoring and user supplied devices

 All types of thin film deposition and PVD techniques including Sputtering and more from our Sydney base in Australia. 

Advanced Material Research tools at affordable cost is the hallmark of Plasmionique's Table-Top and Compact series of PVD, CVD, PECVD ,PE and RIE systems. 

 All types of thin film deposition and PVD techniques including Sputtering and more from our Sydney base in Australia. 

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These systems, despite their small size, integrate the most advanced and sophisticated tools available in the industry. They are also the ideal tools for training the next generation of process engineers. 

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Deposition / Processing Tools Available:

• MAGNION sputtering magnetron:
   
• Target:  1"- 3" in diameter, planar, conducting or dielectric
   
• Balanced or unbalanced magnetic geometry as required
   
• RF or DC generator
   
• Shutter (optional)
   
• Water-cooling
   
• FLARION Reactors :
   
• ICP or CCP reactors
   
• RF power 13.56 MHz, continuous or pulsed
   
• Suitable for PECVD and Etching applications
   
• EVAD evaporation source modules including (as required):
   
• Standard high temperature boats, baskets and filaments for metals
   
• Knudsen effusion cell (K-cell) for low temperature evaporation of organics

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• Hybrid PVD : Combined Magnetron and Evaporaton

 Custom designed, environmentally controlled test chambers made of stainless steel or Teflon, with dedicated ports for pumping, gases and vapors, and diagnostics port, FLOTEST stations are customized tools configured for testing gases, including H2, various chemical vapours and fuel cells. Computer controlled gas, vapour and liquid flow controllers, combined with sensitive pressure, temperature, humidity sensors and voltage, current and frequency analyzers are typical inclusions.

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The advanced control system, allows programming and automation of all process and testing steps, monitoring the responses in real time and logging of the data for further analysis.

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Numerous safety features, software controlled and hard-wired, are included in every system.

 All types of thin film deposition and PVD techniques including Sputtering and more from our Sydney base in Australia.