Solmates’ advanced PLD Pulsed laser deposition equipment gives a leading edge for the entry of new processes into commercial products. PLD will play a key role in the development of future chip designs and the integration of new materials. PLD is now one of the leading Nanotechnology applications.
Solmates' thin film process equipment is based on pulsed laser deposition (PLD). PLD is a Physical Vapour Deposition (PVD) process that offers many advantages above other conventional techniques, like the one-to-one transfer of elements from target to substrate, the ultra low damage to substrates, low temperature growth and excellent control of density. PLD can be compared with Sputtering, only that the plasma is generated by a UV laser irradiation instead of Argon ion bombardment.
PLD has been used for deposition on small scale samples (10 x 10 mm) since 1961. Since then many unique processes were developed but never on wafer scale. Solmates developed PLD equipment for wafers up to 200mm that matches industrial standards. Solmates owns patents on critical aspects of revolutionary PLD technology as well as on specific processes.
Solmates' PLD technology is suitable to deposit many different materials, as can be seen in the overview below. Selected processes have been optimized for specific markets.
PLD pulsed laser deposition system introduction and overview , Australian vacuum services
Cluster PLD deposition system
Introduction PDF on Solmates PLD
Introductory PDF flyer detailing the various system options for PLD pulsed laser deposition available at Solmates through Australian vacuum services
Australian Vacuum Services Pty Ltd
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